Used KLA / TENCOR / LEICA / VISTEC MIS 200 #9240451 for sale
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ID: 9240451
Wafer Size: 8"
Inspection system, 8"
Handler and motor stage
No scope
No Hard Disk Drive (HDD).
LEICA / VISTEC MIS 200 is a state-of-the-art equipment designed for mask and wafer inspection. This system improves technologies used in lithography and optics to increase the production yield of integrated circuit and semiconductor designs by detecting defects and anomalies during the fabrication, assembly and testing processes. LEICA MIS 200 utilizes a patented simultaneous two-dimensional, front and backside, image capturing unit to detect, identify and quantify the defects. This includes scanning both sides of a wafer simultaneously and then combining the data. High-power zoom lenses are integrated into the design, capable of magnifying up to x70 and x30 respectively, allowing for the detection of even very small and delicate mask or leadframe defects. The measurement capabilities of the device makes it especially useful for evaluating within-die or between-die anomalies. The machine is designed to facilitate a multi-task workflow. This allows the user to manage multiple processes, such as defect and ruble inspection, which can be combined into one job for reducing time and effort. Additionally, the scalability of the device allows for an upgrade to match the production throughput needed for ever-increasing levels of design complexity. The software for VISTEC MIS 200 is supplied by the manufacturer and is designed for easy image editing and advanced analysis. It is configured with data formats to allow for simple file sharing across multiple production sites, aiding communication and consistency among production teams. An intuitive user interface provides all the tools needed to effectively inspect and analyze mask and wafer defects. MIS 200 is suitable for precise inspection and analysis of mask and wafer defects in a variety of industries. It is an ideal choice for any production that requires accurate and precise inspection and analysis of mask and wafer defects. LEICA / VISTEC MIS 200 helps to improve automation and productivity, as well as ensuring a higher yield and quality of products.
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