Used KLA / TENCOR MPV CD2 AMC #9043963 for sale

KLA / TENCOR MPV CD2 AMC is a state-of-the-art mask and wafer inspection equipment that combines innovative measurement algorithms and high-speed image acquisition technologies to provide accurate inspection and analysis of semiconductor mask and wafers. It is designed to detect and analyze defects on masks and in the fabrication process of semiconductor devices, allowing for more reliable and efficient production. The system consists of a main control console and a high-resolution digital microscope, both connected to a powerful and reliable PC-based hardware. This allows for speedy processing and measurement of images of mask and wafers. The microscope includes a 12-megapixel, 4x digital zoom camera that is optimally designed for inspecting small-scale features on masks and wafers. Additionally, the unit includes multiple specialized software programs, allowing for easy selection of the most appropriate tool for different inspection tasks. The main module of KLA MPV CD2 AMC is capable of collecting 3-dimensional data of up to 8k x 8k resolution, allowing for unparalleled performance when inspecting wafers and masks. It includes a high-speed image acquisition machine, allowing for high-speed scanning of wafers during inspection. The tool also features specialized algorithms, allowing for fast detection of defects as small as 0.1 micron. Additionally, it features user-selectable algorithms that can be used to analyze data with improved precision and accuracy. The asset also includes a powerful measurement software, which allows users to quickly evaluate the size and shape of structures, including critical dimensions, as well as surface complexities. This software can be used to detect very small defects, giving manufacturers a more reliable model for inspecting delicate mask and wafer fabrication processes. TENCOR MPV CD2 AMC is a truly reliable and innovative equipment for mask and wafer inspection. Its combination of powerful hardware and innovative algorithms create an impressive system ideal for detecting small defects in large-scale wafer and mask fabrication processes. Its high-speed image acquisition capabilities allow for accurate and efficient inspection, making it a powerful tool for manufacturers of complex and small-scale semiconductor devices.