Used KLA / TENCOR MRW 200 #9083812 for sale

KLA / TENCOR MRW 200 is a mask & wafer inspection equipment with advanced features that deliver superior performance for mask and wafer inspection applications. The system offers state-of-the-art optics and hardware configuration, providing fast, accurate and reliable defect detection. It is capable of inspecting wafer defect samples at full-color high resolution up to 5 microns, and allows for faster, more accurate results in a wide range of inspection tasks. The unit is equipped with an advanced label-free detection methodology that accurately identifies defects not visible to conventional inspecting microscopes. The machine's high-resolution image capture and analysis capabilities also enable operators to better categorize defects on the wafer surface. KLA MRW 200 is an integrated tool that combines a programmable, spatial advanced wafer inspection camera, high-resolution laser autofocus asset, high-speed scanning motors, and a fast, high-accuracy die-to-die image capture and inspection engine. This combination provides extremely accurate defect detection and classification. The optics of the model are designed for superior stability and performance, with a high-resolution, high-speed image capture capability. The scanner is equipped with a DMD light engine, providing an adjustable range of wavelengths for better illumination and imaging, while the separate angular and parallel light sources offer a range of lighting options for optimal defect identification. The high-speed motors that power the equipment allow it to carry out partial or full-field inspection simultaneously, enabling faster defect inspection of large wafer samples. The camera is fitted with a dual-channel CCD system, allowing for superior image quality and resolution. Further, the unit provides the ability to perform flexible image analysis, image-based classification of defects, and full-surface defect detection. TENCOR MRW 200 also offers several different modes of operation, allowing users to perform a variety of inspection tasks quickly and easily. These include full-field, high-speed, partial-field and relative enhanced inspection, enabling operators to select the best settings for their particular purpose. In summary, MRW 200 is a powerful and versatile mask and wafer inspection machine that provides superior performance for a variety of applications. Its advanced optics and hardware configuration enable accurate and reliable defect detection, while its robust and programmable design ensures that users can perform a variety of inspection tasks quickly and accurately.