Used KLA / TENCOR / PROMETRIX 2138 XP #121998 for sale

KLA / TENCOR / PROMETRIX 2138 XP is a mask and wafer inspection equipment designed to facilitate the production of semiconductor devices. The system enables the detection of critical defects across multiple masks and wafers in order to guarantee the highest possible quality of a device. The unit includes a high-performance camera, 4-channel laser diffraction technology, integrated pattern recognition and imaging probes. KLA 2138 XP also comes with a comprehensive software suite that provides the flexibility and accuracy needed for precise mask and wafer inspection. TENCOR 2138 XP utilizes a single camera head to capture images of both masks and wafers. The camera head consists of a digital image sensor and optics that automatically adjust to the magnification of the inspected sample. This allows for both high-resolution of small features as well as low magnification of larger features. The high-resolution images enable the user to inspect nanoscale features with unparalleled accuracy. The 4-channel laser diffraction technology used in the machine provides extraordinary detection sensitivity. The 4-channel laser diffraction works by using multiple laser beams to detect minute defects on the mask and wafer. The tool processes the multiple laser beam images together, resulting in much higher sensitivity than a single beam asset. The powerful pattern recognition capabilities of 2138 XP enable the model to easily identify and distinguish between critical defects and non-critical ones. Moreover, the advanced imaging probes integrated with the equipment offer a wide range of imaging capabilities. These capabilities include backside imaging, surface texture analysis and reverse tone inspection. PROMETRIX 2138 XP's imaging probes provide an extremely accurate analysis of surface texture and backside pattern quality. KLA / TENCOR / PROMETRIX 2138 XP also includes a comprehensive software suite that includes an array of powerful and flexible tools for a variety of mask and wafer inspection tasks. The software offers tools such as defect detection and classification, automatic mask registration and defect classification. Additionally, the software provides user-friendly menus and interface that enable the user to easily navigate the complexities of the system. KLA 2138 XP provides the highest level of defect detection accuracy and coverage for masks and wafers. Its high-resolution camera, 4-channel laser diffraction technology and integrated pattern recognition and imaging probes, combined with its comprehensive software suite, provide users with the tools they need to guarantee the highest level of quality in their semiconductor devices.