Used KLA / TENCOR / PROMETRIX 2138 XP #9004619 for sale

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ID: 9004619
Wafer Size: 6"-8"
Vintage: 2006
Wafer inspection system, 8" (6" applicable) Pixel SIzes: 0.25, 0.62, 0.39, 1.25 Operating System: Windows NT AutoSAT ADC: NA (additional cost) MM2 Automation: GEM/SECS Handler (2) Port Open Cassette 2006 vintage.
KLA / TENCOR / PROMETRIX 2138 XP is a high-end mask and wafer inspection equipment designed for the most exacting critical applications. With superior optics, mechanical design, and electronics design, it provides much higher throughput, better resolution, and more comprehensive wafer analysis. This system is designed to meet the stringent manufacturing requirements of the semiconductor industry and is an ideal solution for inspecting the most challenging masks and microelectronic devices. KLA 2138 XP features a hybrid optical-mechanical unit that allows for both detailed particle analysis and fast performance. The optics machine comprises a dichroic mirror that transmits and reflects light from different directivity inputs and fullfilm and sub-micron imaging technologies. The mirror is capable of capturing light from both the front and backside of the wafer, enabling accurate three-dimensional images of defects. It also highlights the faintest defects, making them easy to identify in the images. The mechanical architecture of TENCOR 2138 XP is designed to inspect both large and small areas quickly and accurately. Its high throughput capability and sophisticated controls make it well-suited for high-volume correction of critical defects on masks and circuits. It has high sensitivity, with a sensitive area of up to 8.5 µm and an extended range of up to 15 µm. Overall, it can inspect up to 1,000 wafers per hour, giving it a remarkable efficiency advantage over other systems. The tool also integrates the latest high-resolution electron imaging technologies to detect even the most minute defects. The electron imaging asset seamlessly integrates with the optical-mechanical inspection model to provide an expansive field of view, high detection accuracy and a wide range of helpful analytical features. All in all, 2138 XP provides superior mask and wafer inspection capabilities for the semiconductor industry. Its state-of-the-art optical, mechanical, and electron imaging technologies offer speed, accuracy, and reliability, making it the perfect choice for inspecting today's most complex microelectronic devices.
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