Used KLA / TENCOR / PROMETRIX 2138 XP #9153008 for sale

KLA / TENCOR / PROMETRIX 2138 XP is a mask & wafer inspection equipment designed to inspect critical pattern defects on photomasks and wafers. The system utilizes advanced electron beam (e-beam) inspection technology to analyze images of a device and identify any defects on a nanometer scale. The unit can detect missing lines, short circuits, open circuits, undercut features, and line width erros among other possible errors. KLA 2138 XP consists of three primary components: the e-beam device, imaging, and analytics. The e-beam device is responsible for scanning the surface of the device and generating images of its surface. The imaging machine then takes these e-beam images and processes them using an advanced algorithm to identify and analyze any defects on the device. The analytics tool then takes the analysis results and applies a variety of advanced algorithms to determine the location, size, and category of the defects. All of this analysis is done in real time to ensure that any possible defects are detected and analyzed accurately. TENCOR 2138 XP uses a large high-precision e-beam to scan the device at several different angles and distances to ensure full coverage. This allows for more accurate images which are then analyzed for defects using advanced algorithms. It can scan surfaces as small as 0.2 microns, making sure that all possible defects are detected and analyzed. The imaging asset then utilizes its high resolution cameras to capture images of the device and convert these images into useful data points. The analytics model then takes these data points and applies a variety of algorithms to determine the size and location of any found defects. It can also detect and differentiate between overlapping areas, allowing for better accuracy when identifying any defects. The analytics equipment also allows the user to set up custom parameters, such as defect size and shape, to allow for better and more accurate results. PROMETRIX 2138 XP is designed to be a reliable, efficient, and accurate mask & wafer inspection system. It utilizes advanced e-beam inspection technology and a sophisticated analytics unit to ensure accurate defect analysis and detection. Its advanced analytics capabilities make it capable of producing reliable results, even on extremely small surfaces, and its user-friendly interface makes it easy to operate. Finally, its modular design allows users to easily upgrade and customize the machine for specific applications.