Used KLA / TENCOR SCD-200 #9155471 for sale

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ID: 9155471
Vintage: 2006
Thickness measurement system 2006 vintage.
KLA / TENCOR SCD-200 mask and wafer inspection equipment is specifically designed to meet the demands of the most challenging failure analysis and production applications. It combines high performance, high speed, and high accuracy with the flexibility and scalability needed to characterize masks and wafers at the device, circuit, and layout levels. KLA SCD-200's mask inspection and critical defect detection capabilities are based on quad luminance imaging. By providing four separate camera views, exceptional illumination of topological and colorimetric mask features can be achieved for both brightfield and darkfield lighting techniques. This enables more accurate resolution, detection, and characterization of near-critical defects on masks and wafers. The system also offers a comprehensive suite of redundant, semi-automated review tools. By combining an intuitive user interface with advanced pattern recognition technology and defect detection algorithms, TENCOR SCD-200 can detect even the smallest defects quickly and accurately. The powerful segmentation and labeling capabilities further help reduce development time and improve inspection accuracy. The inspection unit is also equipped with advanced proven production algorithms, which use sophisticated blur detection, edge detection, and texture analysis techniques. These are designed to "learn" the signal-to-noise ratio of each mask or wafer, enabling enhanced defect detection and characterization capabilities, particularly for challenging 3D circuit profiles. The machine also includes a comprehensive set of visualization and analysis capabilities. Interactive 3D views can provide detailed information about near-critical defects, such as overlay violations, resist flow irregularities, CD (Critical Dimension) offsets, and design tracking errors. Advanced visualization tools help enable the most comprehensive mask and wafer analysis available today. SCD-200 also offers a number of environmental solutions, including a three stage, closed-loop cooling tool. This helps ensure that the asset performs within a consistent temperature range for greater stability and reliability. Additionally, the inspection model is compatible with popular SEMI-S2 compliant databases, making it possible to archive defect reports and easily retrieve them later for further review. In summary, KLA / TENCOR SCD-200 mask and wafer inspection equipment provides a comprehensive set of inspection, analysis, and environmental features. It is capable of providing the highest level of accuracy, enabling faster time-to-market and better product yields.
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