Used KLA / TENCOR SCD-XT #9228108 for sale

KLA / TENCOR SCD-XT is a mask and wafer inspection equipment designed to accurately and reliably inspect photomasks and wafers up to 450mm in diameter. The system utilizes Brightfield Illumination, a combination of bright and dark light sources, and pattern-based illumination to accurately detect defects as small as one tenth of a micron. The unit can detect edge placement errors, line widths and shape defects, as well as a variety of other defect types on neither masks nor wafers. It has the ability to detect up to eight different types of defects simultaneously. KLA SCD-XT machine consists of an inspection head, which provides brightfield illumination and pattern-based illumination, and a series of optical components and signal processing electronics. The tool has a high-resolution CCD camera, which captures optical signals from layers and patterns on a mask or wafer. The camera is then connected to an image processing unit, which processes the signals to detect defects. Inspection data is stored in an internal database, and the user can recall stored inspection data with the touch of a button. TENCOR SCD-XT asset includes a full suite of software, ranging from basic Inspector Suites to robust Vision Studio Suites, which enable users to inspect images on any model in their factory. SCD-XT has a host of features that allow users to customize the equipment to fit the needs of their specific application. The system is available with Granite Stable Structure technology, which provides vibration-free inspection. This allows users to perform high-precision inspections, even in a production environment. The unit also offers various spatial filtering techniques, allowing users to analyze image data in real-time, as well as the option of adding an additional detector head for expanded capabilities. KLA / TENCOR SCD-XT machine is designed to be reliable and easy to use. The intuitive software interface enables users to quickly navigate and set up inspections with ease. The tool is also highly customizable, allowing users to customize the asset to their specific needs and even add additional components to increase the model's capabilities. Overall, KLA SCD-XT is a reliable and powerful equipment that can accurately inspect photomasks and wafers up to 450mm in diameter. The system utilizes brightfield illumination, pattern-based illumination, and a host of other features to accurately detect defects as small as one tenth of a micron. The unit is also highly customizable and intuitive to use, enabling users to quickly and easily set up inspections and recall stored data.