Used KLA / TENCOR SL3 #293829418 for sale

KLA / TENCOR Starlight SL3 is an advanced mask and wafer inspection equipment designed for use in semiconductor fabrication operations. It offers high-resolution imaging to identify defects and contamination from mask surfaces, as well as the wafer surfaces themselves. The system also provides advanced imaging and analysis tools to quickly find and identify defects. KLA Starlight SL3 features a high-performance optical unit with advanced wavelength selection and higher numerical aperture to ensure better image quality. This includes a dual axis scanner, which scans and images the mask surface at two angles to allow for more accurate defect detection. The machine also includes several advanced imaging techniques, such as spot-scanning, line-scanning, and panoramic framing, which ensure that wafer and mask surfaces are accurately inspected at the highest magnification possible. TENCOR Starlight SL3 features a sophisticated image analysis tool to detect, classify, and measure defects present on the Mask and wafer surfaces. This includes the Adaptive Defect Detection Asset (ADDS), which can "learn" to identify defects in mask and wafer surfaces that may not be easily identified by humans. The Defect Review and Analysis Module (DRAM) allows for the detailed analysis of defects and contaminants, providing real-time feedback on their location, type of defect, size, shape, and amplitude. The model also offers automatic defect classification to minimize the need for manual inspection. Starlight SL3 provides inspector-friendly operation and a powerful operator interface. It includes several software packages to help operators set up, configure, and control the equipment. These include the Mask Editor Software, PC Inspection Software, and Win Toolbox Software. The system can also be integrated with other semiconductor fabrication equipment and databases to provide a comprehensive view of the production process. KLA / TENCOR Starlight SL3 is designed for reliable and accurate operation with a small footprint. Its low cost of ownership and minimal maintenance requirements make it an ideal choice for many semiconductor fabrication operations. The unit is designed to provide manufacturers with quick and accurate defect detection from their critical mask and wafer surfaces.