Used KLA / TENCOR SL301 #9251376 for sale

KLA / TENCOR SL301 is a state-of-the-art mask and wafer inspection equipment used for semiconductor production. The system's features provide engineers and technicians with comprehensive metrology capabilities to ensure process control and quality assurance. KLA SL301 includes a 200-mm/300-mm inspection chamber that accommodates substrates such as silicon wafers, compound semiconductor wafers, IC packages, and advanced MEMS structures. The unit offers a host of imaging options that include CCD, photoresist, and low- and high-K dielectric measurements. TENCOR SL301 machine runs proprietary software to facilitate real-time defect detection and provides users with numerous tools for reconstructing the 3D shape of defects to evaluate surface qualities. The various stages of inspection include manual substrate loading via a robot arm, feature measurement, and defect inspection. Additionally, the tool is equipped with various automation devices, such as a barcode reader and a light trap to prevent substrate damage or contamination. SL301 is equipped with an automated focus control (AFC) feature that ensures proper focus during a scan. It also houses an improved optical design that ensures critical defect resolution. KLA / TENCOR SL301 asset also utilizes a high-resolution telecentric lens that is able to inspect various features on complex structures, without the need for reticles. Additionally, it is compatible with a wide array of imaging tools, such as a MEMS electrostatic chuck for improved performance. The model comes with an intuitive user-friendly GUI that allows users to quickly and efficiently monitor, configure, and analyze the equipment. It also features an array of measurement patterns that can be personalized to the user's specific needs. In addition, the system has several fail-safes that protect the equipment and the operator from any potential harm. Overall, KLA SL301 is an ideal mask and wafer inspection unit for any production environment. It offers a comprehensive suite of imaging, defect detection, and process control features to provide engineers and technicians with precise defect resolution and improved process control capabilities. Lastly, its intuitive user interface makes the machine easy to use for operators of all skill levels.