Used KLA / TENCOR Surfscan SP1 Classic #9147123 for sale

KLA / TENCOR SP1 Classic Mask and Wafer Inspection equipment is an industry-leading optical inspection and review system. This platform is used for precise inspection of advanced lithography reticles, photomasks, wafers, and other patterned materials, enabling cost-efficient analysis and optimization of device and overlayer critical dimensions (CD) and design. Equipped with advanced side scatter imaging technology and a variety of automated mask and wafer inspection systems, KLA SP1 Classic unit provides clean, repeatable results that meet ever-stricter yield requirements. TENCOR SP 1 CLASSIC Mask and Wafer Inspection machine provides a wealth of features for pattern inspection and review. All measurements and results are based on the highest measurement accuracy. Advanced imaging and inspection technologies combine for fast, automated particle and defect detection, feature edge analysis and transparent film thickness measurement—all within an ergonomic, user-friendly platform. TENCOR SP1 Classic tool integrates KLA patented automated particle inspection asset, which is designed to quickly and cost-effectively identify and measure particles on a range of wafers. Advanced algorithms allow for rapid analysis of low to moderate exposures and volume defects, while the model's self-calibrating high-resolution optics improve throughput and accuracy. For greater pattern recognition, a variety of automated mask inspection systems share a single piece of hardware, enabling consistent measurements and inspections across multiple technologies. As a precision analysis platform, SP1 Classic Mask and Wafer Inspection equipment is designed to support multiple inspection tools in a single platform, saving cost and time. This feature also allows for easy pattern recognition and enhanced defect identification. Multiple images and analysis methods are also available, including edge measurement, effective inspection, overlay observation, layer-by-layer viewing, flat pixel viewing, cross-sectioning, and tilt viewing for optimized reviews. KLA / TENCOR SP 1 CLASSIC platform also includes a comprehensive suite of analysis and reporting capabilities for accurate module-level and wafer-level yield optimization. Automated materials scanning, labeling, calibration, and reporting are all achievable through the system's intuitive software. Smart data storage allows for optimum capacity utilization and faster analysis, while batch analysis and sharing mitigates risk and downtime associated with manual data entry. SP 1 CLASSIC Mask and Wafer Inspection unit is an essential tool for engineering teams working on cutting-edge process nodes in the semiconductor, opto-electronics, photomask, and nanotechnology industries. Through this platform's precision inspection and consistently accurate results, users benefit from improved overall yield rates and cost savings in product development.