Used KLA / TENCOR Surfscan SP1 Classic #9211403 for sale

KLA / TENCOR SP1 Classic is a mask and wafer inspection equipment designed for both production and research-and-development applications. It provides a combination of high-resolution direct view inspection, automated defect review, and optical in-line metrology for the most demanding defect-inspection applications. The SP1 system offers an adjustable imaging design, which allows images of varying size, magnification, and repetition rate to be acquired quickly and accurately. The imaging design includes a full range of digital image and software components, such as advanced photeometric, radiometric, and pattern identification algorithms, and a multipoint illumination unit. The SP1 machine also offers high-resolution imaging of up to 1.0 micron pitch, which is more than sufficient for viewing critical-dimension (CD) structures, as well as imaging low-magnification defects. Furthermore, the SP1 tool is capable of capturing images at rates of up to 2000 frames per second, and can be configured to image the entire wafer within a 24-hour period. The imaging design of the SP1 asset is complemented by a cutting-edge defect review model, which employs a powerful combination of vision algorithms, complex data analysis tools, and a sophisticated automatic classifying equipment. This defect review system facilitates automated inspections for a variety of defect types, including process-induced particles, opening/trenching defects, and PSMs. The defect review unit can also be configured to incorporate user-defined tests, such as automated BGA connectivity tests, or a simple pixel comparison test. In addition, the SP1 machine features an integrated optical in-line metrology tool, which provides comprehensive measurements of wafer profile forms and their associated critical dimensions. This metrology asset is capable of measuring a wide variety of critical dimensions, including overlay, line widths and spacings, critical area sizes, critical layer thicknesses, and line edge roughness. Finally, the SP1 model also includes a suite of advanced software tools, which simplify the acquisition, processing, and storage of image data. These software tools include detailed defect-classification analyses, automated defect-marking and repair capabilities, and sophisticated photometric and radiometric imaging options. Overall, KLA SP1 Classic is an advanced mask and wafer inspection equipment that offers a wide range of features for a variety of defect-inspection applications. With its adjustable imaging design, high-resolution imaging, automated defect-review system, and optical in-line metrology capabilities, the SP1 unit is ideal for production and research environments that require comprehensive defect-inspection solutions.