Used KLA / TENCOR SP1 Classic #9262584 for sale

ID: 9262584
Wafer surface analysis system Does not include loader.
KLA / TENCOR SP1 Classic mask and wafer inspection equipment is a high-performance integrated system that provides superior pattern and defect inspection capabilities for advanced semiconductor and lithography processes. It is designed to meet the specific demands of the semiconductor industry, providing accurate and reliable inspection of both masks and wafers for a variety of parameters, including critical dimension (CD) measurement, overlay positioning, and defect inspection. KLA SP1 Classic features KLA unique QuadraVista™ image processing technology, which utilizes patented algorithms to deliver ultra-high accuracy and resolution in defect detection. QuadraVista provides superior image contrast and noise reduction, ensuring excellent sensitivity and reliability in the detection of defects. With sophisticated automation and ease-of-use, TENCOR SP 1 CLASSIC is designed to reduce data processing time and manual operator interaction. SP1 Classic is equipped with a high-resolution linear field-of-view (FOV) detector, and utilizes Double-Pass focus technology to accurately measure optical characteristics and overlay performance. Defect inspection can be performed in a variety of modes, including aerial defocus, aperture defocus, and image-based inspection. The unit also features automatic defect classification algorithms that can accurately and rapidly identify subtle defect features, such as local edge and straightness. TENCOR SP1 Classic is designed to facilitate rapid automated calibration and measurement of critical dimensions (CDs). Using a high-precision stage and laser-based scatterometry techniques, it is capable of measuring CDs with tolerances as small as 0.2 microns. The machine also features automation control and error monitoring capabilities, allowing for efficient and error-free tool operation. KLA SP 1 CLASSIC is powered by a Linux™ operating asset and an Intel® processor, providing reliable and efficient operation. Its modular architecture design makes it highly upgradeable, allowing it to keep up with the changing needs of the semiconductor industry. Additionally, the model is available with a variety of options, including an advanced DUV illumination source, multi-head inspection capabilities, and a global-stage configuration. SP 1 CLASSIC is an excellent choice for advanced semiconductor metrology applications. It offers superior image processing capabilities, high-precision profiling, and fast wafer inspection, making it ideal for high-speed production and metrology applications.
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