Used KLA / TENCOR SP1-DLS #9215544 for sale
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ID: 9215544
Wafer Size: 12"
Vintage: 2006
Particle measurement system, 12"
Light source: Solid state laser
Laser wavelength: 488 nm
Laser power: 75 mW
Normal incidence: 77 nm (90°)
Oblique incidence: 50 nm (20°)
Operating system: Windows XP Servicepack2
2006 vintage.
KLA / TENCOR SP1-DLS is a mask and wafer inspection equipment, designed to provide fast and reliable detection and analysis of defects in semiconductor wafers and masks. The system is built on KLA leading-edge, proven imaging technology to ensure the highest degree of accuracy and reliability. This automated unit is designed for high yield production in demanding, high-volume environments and is suitable for use in semiconductor fabrication facilities, integrated circuit, and electronic material process development and on-line trepanning and metrology. KLA SP1 DLS employs high-resolution CCD camera optics to produce high-resolution, full-frame images of the wafer surface and mask, then overlaying patterns of expected content onto the acquired images. This allows for more accurate and highly reliable determination and characterization of defects. The detailed images can be further enhanced with backlighting and/or side lighting techniques, and provide greater imaging fidelity than traditional photographic methods. The machine is loaded with a variety of advanced algorithms for defect classification and discrimination, such as including Rayleigh-Solomon and/or Parametric Contouring with Advanced Image Processing (PCAIP). It also employs a number of defect types and patterns for comparison against expected contours. This combination of algorithms and technologies allow for greater sensitivity and accuracy of defect detection, which in turn allows for improved process control and the development of predictive process models. TENCOR SP 1-DLS is a self-contained tool that requires minimal installation or setup. Simply place the sample into the shallow scanning chamber and the asset will take care of the rest. It is equipped with a touch-screen LCD display for easy operation and offers a range of software options for data acquisition, analysis, and defect determination. The large scan area of up to 150 mmx 100 mm can accommodate up to 5 wafers at a time, and the frame rate is adjustable from 40 to 200 frames per second. KLA SP1-DLS is designed to increase throughput and reduce costs by providing higher throughput, faster defect recognition and characterization, and compatibility with a variety of other products in the semiconductor industry. It also reduces the risk of disruptive errors and faults in end-products. Additionally, KLA / TENCOR SP1 DLS is easy to use, with intuitive and user-friendly operation, and provides comprehensive documentation, resulting in shorter on-boarding times and reduced learning curves.
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