Used KLA / TENCOR SP1-DLS #9255089 for sale

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ID: 9255089
Wafer Size: 12"
Vintage: 2006
Wafer inspection system, 12" Dual FOUP No bright field option No SMIF 2006 vintage.
KLA / TENCOR SP1-DLS is a mask and wafer inspection equipment designed to meet the exacting requirements of modern semiconductor plants. The system inspects a wide variety of wafer patterns, providing accurate results with exceptionally low false-alarm rates. Using KLA proprietary embedded deep learning algorithms, KLA SP1 DLS achieves unprecedented levels of accuracy in defect review and classification. The unit operates by imaging the wafer surface with a microscope, and then analyzing the results through specialized software. It can then identify defects in the patterns, characterized and grouped by size and type. The machine can also identify isolated and patterned defects, while also distinguishing between line width, line width/edge sharpness, and line edge roughness. TENCOR SP 1-DLS utilizes a highly flexible and reliable wafer preparation platform, allowing equipment operators to quickly and easily prepare wafer for inspection. This platform is robust enough to withstand repeated cleaning procedures, and is designed to maximize production rates and reduce part-per-wafer counts. The tool features an automated file transfer and analysis control interface, allowing operators to quickly and easily transfer information throughout the plant and to upstream and downstream systems. This interface also provides an intuitive user interface, making it easy to control the asset from a remote location. KLA SP1-DLS incorporates advanced review verification functionality, allowing operators to quickly and easily verify inspect results. This functionality is backed up by TENCOR embedded deep learning algorithms, which accurately identify subtle pattern changes. Additionally, the model tracks tool metrics and performance, which allows operators to quickly and easily diagnose and troubleshoot equipment performance. Overall, TENCOR SP1 DLS is a powerful, reliable, and versatile mask and wafer inspection system. It's advanced embedded deep learning algorithms provide superior accuracy in defect review and classification, while its automated file transfer and analysis control capabilities and intuitive user interface make operating the unit a breeze. It's robust wafer preparation platform and review verification capabilities help to reduce part-per-wafer counts, and its tool metering functionality provides operators with valuable performance information. Taken together, these features make SP 1-DLS an ideal choice for modern semiconductor plants.
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