Used KLA / TENCOR SP1-DLS #9257954 for sale

KLA / TENCOR SP1-DLS is an advanced mask and wafer inspection equipment used to inspect the accuracy of photomasks used in the manufacturing of semiconductor devices. Photomasks are used to create components on semiconductor chips that house electronic components, the quality of the masks are critical for producing high quality semiconductor devices. KLA SP1 DLS system features multiple sophisticated technologies to help ensure reliable, accurate inspection of photomasks and to monitor process changes and diagnose defects. The unit's core features include a high-resolution micro-mirror based imaging machine, a progressive scan digital color camera, advanced image processing algorithms, and an integrated defect inspection tool. The high resolution micro-mirror based imaging asset is composed of a pair of digital cameras combined with rapid scan illumination. The progressive scan digital color camera captures a full color image in a single integration period, while the rapid scan illumination is used to remove various background and surface artifacts. TENCOR SP 1-DLS also offers advanced image processing algorithms. The model utilizes a combination of pattern matching, transformation algorithms, and filter-based intensity scaling algorithms to analyze images and detect defects. By utilizing a step-by-step analysis process, the equipment is able to quickly identify potential defects, even in highly complex patterns. The integrated defect inspection system offers a user-friendly solution for analyzing images for potential defects. By utilizing defect analysis templates, users can easily inspect images for defects and classify them. After the classification is complete, automated tools can be used to organize the defects and generate reports. Finally, KLA SP 1 DLS also features an automated defect defect comparison unit, letting users compare defects across multiple photomasks or wafers. By using this feature, users can quickly identify areas where defects are present or determine if new defects have appeared. To sum up, KLA / TENCOR SP 1-DLS machine is an advanced mask and wafer inspection tool used to ensure highly accurate photomasks for the production of reliable semiconductor devices. The asset employs multiple advanced technologies, such as a high-resolution micro-mirror based imaging model, a progressive scan digital color camera, and advanced image processing algorithms, to detect and classify defects quickly and accurately. The integrated defect inspection equipment offers a user-friendly method of inspecting images for defects while the automated defect comparison system allows users to compare defects across multiple wafers and photomasks.