Used KLA / TENCOR SP1-DLS #9267039 for sale

KLA / TENCOR SP1-DLS is an advanced metrology tool for mask and wafer inspection. The equipment combines advanced optics and structured light projection technology, with wafer and mask inspection capabilities to accurately monitor production surfaces. KLA SP1 DLS is designed to detect and classify defects on wafers, masks, and other substrates quickly and accurately. The system utilizes imaging, digital zooming, and pattern recognition technologies to capture and measure features with micro-level accuracy. The unit is designed to inspect a wide variety of substrates, including glass, ceramic, and semi-conductor material. The machine is capable of detecting and distinguishing between visible particles, invisible particles, and other anomalies. It is also capable of inspecting nano-sized particles, which can provide more detailed information on the character and complexity of any particular defect. TENCOR SP 1-DLS utilizes a high-sensitivity, telecentric 5-axis view tool with advanced illumination technology to acquire images at various angles, providing wide coverage on the substrate. The asset can be programmed to inspect a variety of inspection target sizes, locations, and measurement levels. KLA SP 1-DLS is capable of generating 3D images with multiple exposure steps for further analysis. The high-resolution, onboard color camera combined with advanced imaging software and analysis algorithms enable the model to accurately classify defects based on their size, shape, and location. The equipment utilizes an onboard pattern recognition system and statistical algorithms to further aid in the defect classification process. SP1 DLS is supported by advanced data logging software, for efficient data acquisition, review, and archiving. Furthermore, SP 1-DLS is designed to be expandable, so that additional sensors and modules can be integrated into the unit as needed. This allows for additional levels of automation in the inspection process. Overall, TENCOR SP1-DLS is a powerful, precise machine for mask and wafer inspection with advanced optics and imaging capabilities. The tool's high-resolution imaging, digital zooming, and pattern recognition technologies coupled with advanced data analysis algorithms enable TENCOR SP 1 DLS to accurately characterize and classify different types of defects. This makes KLA / TENCOR SP 1 DLS an invaluable asset for ensuring high-precision production in the semiconductor industry.