Used KLA / TENCOR SP1-DLS #9267043 for sale

KLA / TENCOR SP1-DLS
ID: 9267043
Particle measurement system Does not include Hard Disk Drive (HDD).
KLA / TENCOR SP1-DLS is a state-of-the-art mask and wafer inspection equipment suitable for the most demanding applications in semiconductor wafer fabrication and engineering. It is a comprehensive inspection system capable of detect multiple defects in a wide range of applications. Features include multi-beam scanning for increased sensitivity, high resolution imaging for detecting small defects, 3D detection using oblique lighting to detect both surface and subsurface features, defect localization capabilities for rapid defect repair cycle time, and high throughput for processing multiple wafers at once. KLA SP1 DLS unit offers a flexible, cost-effective solution for inspecting advanced point, line and area defects. It has a large field-view imaging machine for large-area inspection and can capture brightfield, darkfield, edge detection, contrast enhancement and 3D surface measurements of up to 310 mm (12.2 in) wafers. It also has various image analysis capabilities to detect a wide variety of defects that may occur during semiconductor fabrication. In addition, TENCOR SP 1-DLS tool provides distinct image tracking capabilities to help ensure precision and accuracy during scanning. The asset is also equipped with advanced illumination capabilities offering a combination of oblique and normal illuminations, with various polarization schemes, to detect both surface and subsurface defects. This provides the user with the ability to detect defects that are difficult to observe with traditional inspection techniques, as well as improve defect localization accuracy. KLA SP1-DLS model is capable of integrating into any production environment. It also features real-time statistical process control (SPC) and data tagging capabilities for rapid decision-making and defect management. The equipment offers a combination of robust software and hardware, allowing for powerful yet flexible online-adjustable defect thresholds and inspections speeds. Furthermore, the system is designed for easy installation, integration, and maintenance, which provides ease of use and supports high throughput performance. In summary, TENCOR SP1 DLS is a comprehensive solution for mask and wafer inspection designed to provide reliable, accurate and fast detection of anomalies and defects. It is a cost-effective and user-friendly unit suitable for the most demanding inspection applications in the semiconductor industry.
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