Used KLA / TENCOR SP1-DLS #9267047 for sale

KLA / TENCOR SP1-DLS is a high-level mask and wafer inspection equipment designed for use within the semiconductor fabrication industry. This system provides comprehensive, high-resolution imaging that is capable of scanning through a range of materials, such as photomasks, epoxy materials, and anti-reflective coatings. The unit uses state-of-the-art optical imaging to obtain detailed images of the material, providing fast and precise imaging to allow the user to quickly identify potential defects. The optics used within the machine use advanced, monolithic aperture mask designs to help reduce noise and eliminate speckle, providing significantly higher resolution images. This tool also offers a range of high-level image analysis capabilities, providing advanced algorithms to quickly detect defects while minimizing erroneous results and false alarms caused by distracting signals. The imaging asset also allows for rapid changeover between different types of samples, helping reduce or eliminate down-time. KLA SP1 DLS utilizes an ultra-high resolution detector array, which scans the material at up to 50 frames per second, ensuring that all of the material is consistently analyzed. The user can even install and configur application specific detection algorithms in order to best suit their specific application. In addition, the model is also capable of automatically measuring and tracking different sample parameters, such as defect size, shape, position, and density. This equipment also offers automated classification of detected defects for improved efficiency. All of these features make TENCOR SP 1-DLS system a reliable and efficient solution for mask and wafer inspection purposes. Its high-level imaging and analysis capabilities make it perfect for any operation that requires high-quality, high-resolution imaging results that are both reliable and accurate. This unit is ideal for operations looking for superior mask and wafer defects detection capabilities.