Used KLA / TENCOR SP1-DLS #9283698 for sale

KLA / TENCOR SP1-DLS is a leading-edge mask and wafer inspection equipment designed for advanced photomasks, single wafer, and batch test structures. This system is used to detect any defects in the photomasks and wafers and is capable of scanning up to 12 wafers/masks simultaneously at high speeds. KLA SP1 DLS is equipped with a multi-beam laser sensor, capable of capturing multiple images at a time. These images are then analyzed for defects, in sizes ranging from 0.7 μm to larger defects. The defect analysis can be done manually as well as with the help of skilled operators. TENCOR SP 1-DLS unit is equipped with auto-programming and auto-inspection features, which make it easier and faster to inspect wafers and masks. The machine also has a defect review program that allows users to segment, minimize, visualize, analyze, and report defect locations. This tool can handle a variety of materials, including organic and inorganic films, and is capable of capturing images of low and high reflective surfaces. KLA SP 1-DLS asset offers users advanced defect detection, image processing, and data analysis. It uses real-time technology to scan and analyze large amounts of data, and quickly generate multiple images from different angles. Data can be exported to any third-party software for further analysis. The model features customizable parameters that allow users to adjust the defect detection based on their needs. TENCOR SP 1 DLS equipment is one of the most advanced systems for mask and wafer inspection on the market. This advanced system is capable of detecting tiny defects, provides accurate data analysis and report generation, and offers affordable pricing. It is suitable for a variety of applications and is designed to provide high performance and reliability in mask and wafer inspection applications.