Used KLA / TENCOR SP1-DLS #9375212 for sale

KLA / TENCOR SP1-DLS is a mask & wafer inspection equipment developed by KLA, a global provider of process control and yield management solutions. This system is designed to enable manufacturers in the semiconductor and electronics industries to quickly and accurately inspect their mask and wafer designs for dimensional fidelity and pixel accuracy. This unit utilizes advanced imaging and pattern recognition technologies to scan and analyze mask and wafer designs at all resolutions and aspect ratios. KLA SP1 DLS is an automated machine that combines illumination and metrology control into a single unit to accurately inspect mask and wafer surfaces. It is designed to provide fast, reliable data comparison and validation, allowing users to quickly identify anomalies or defects and analyze their impact on production yield. The tool includes multiple alignment modes and a 3D topography feature that allows users to measure and characterize structures on a wafer and mask in two directions; one in the X-Y plane and one the Z-plane. The asset utilizes a high-resolution digital imaging device and a high-precision scanner to acquire and display image files of mask and wafer surfaces. The model is capable of image capture at resolutions of up to 300 nanometers. The data accuracy is further enhanced by a miniscope equipment directly built into the system that is used for fine feature scanning. The unit is equipped with a suite of advanced software tools for image processing and analysis, including a 3D topography tool that allows the user to measure height, width, and other features on a wafer or mask in three dimensions. The machine also includes a defect detection and comparison tool, which can be used to compare images from different masks or wafers to detect and monitor any size differences. The tool supports a wide range of industry standard data formats such as GDS-II, Oasis, and others. In addition to its sophisticated imaging and analysis capabilities, TENCOR SP 1-DLS asset also offers a host of yield analysis and process control features. The model includes both a geometry inspection report builder, which can generate reports on defect size and location and a process window optimization tool, which can analyze and adjust the process window settings for each product. The equipment also offers a complete defect review and tracking capability and a user-defined tolerance matrix for mask and wafer comparisons. Overall, KLA / TENCOR SP 1-DLS is an advanced mask and wafer inspection tool that offers manufacturers a means to quickly and accurately analyze their mask and wafer designs. It features a comprehensive suite of imaging and analysis tools, along with yield analysis and process control features that enable manufacturers to optimize their production yields and improve their overall process performance.