Used KLA / TENCOR SP1-DLS #9390501 for sale

KLA / TENCOR SP1-DLS is a state-of-the-art mask and wafer inspection equipment. It is designed for use in semiconductor fabrication and provides high- resolution aerial and interference imaging, allowing for the inspection of very fine geometries on wafers and masks. The system utilizes a variety of imaging technologies in order to deliver accurate, reliable results. KLA SP1 DLS provides sub-micron aerial resolution image data over a broad-spectrum light source range in both transmissive and reflective detection modes. Accurate imaging is enabled by the use of Channels-optics, which allow for resolution down to 0.2 microns on 30x binned images. It also utilizes a high-sensitivity, low-noise 16-bit CCD camera that further enhances the unit's imaging capabilities. TENCOR SP 1-DLS utilizes a variety of inspection technologies in order to analyze the wafer and mask. These include Brightfield, Darkfield, Focus Variation, MicroBrightfield and MicroBrightfield-Laser. Brightfield mode is an imaging technique used to detect defects associated with the identity, alignment, and size of a feature. Darkfield mode utilizes oblique illumination to identify defects, wetting and particles, while Focus Variation Mode is used to detect discrepancies in the height profile of chips and surfaces. MicroBrightfield and MicroBrightfield-Laser modes are used to identify subsurface defects associated with micro lithography; lasers are used to detect micro-cracks and delamination. The machine also provides a wide range of automated functions. These include wafer mapping, auto-focus, optimization, and defect grading. Wafer mapping allows for the quick and accurate mapping of various regions on a wafer and can detect multiple types of defects. Auto-focus enables the tool to quickly and accurately set the focal distance during inspection, while optimization allows for further increased accuracy by tuning the imaging and illumination settings. Finally, defect grading identifies and classifies various types of defects. SP 1-DLS also incorporates advanced software features. These provide a number of benefits, such as image playback and multiple-image comparison capabilities. Image playback allows operators to view images and control features such as time intervals, while multiple-image comparison enables the review of images taken at different stages of the inspection. In conclusion, KLA / TENCOR SP1 DLS is a high-performance mask and wafer inspection asset. It utilizes a range of imaging and inspection technologies in order to provide accurate, reliable results. It also incorporates a variety of automated functions and advanced software features in order to maximize efficiency. As such, KLA SP 1-DLS is an ideal solution for semiconductor fabrication.