Used KLA / TENCOR SP1 Surfscan DLS #9049199 for sale
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ID: 9049199
Particle measurement inspection system, 12"
Software Version: 4.200
Standard Specification:
Haze, Analysis & Normalization
MX4.2 SR03 Software Application
Desktop Software for first Article
Normal & Oblique Illumination
Opt, Enhcd Edge Exclusion 2mm
Puck Handling - 300/200mm
XY Coordinates
Hardware Configuration:
Microsoft WinXP5.1
E40/E87/E90/E94
E84 enabled for OHT & AGV/RGV
GEM/SECS (Comm Port)
GEM/SECS (HSMS)
ASYST AXYS-21 Robot
300mm Dual FIMS Bulkhead Asyst
Two AdvanTag SingleWire CID
4 Color Light Tower
Brightfield
2004 vintage.
KLA / TENCOR SP1 Surfscan DLS is a high-accuracy, automated mask and wafer inspection equipment. This system offers a wide array of tools designed to detect errors in masks and wafers during the production of integrated circuits. It helps reduce costs associated with re-masking, re-inspection, and other corrective repair tasks prior to product release. KLA SP1 Surfscan DLS can detect errors such as thin-film defects, surface topography features such as measurement of peak-valley heights, and other types of structural and electrical defects. The unit uses sophisticated algorithms to quickly and accurately detect defects on the wafer and mask surface. It also supports a wide range of integrated circuit designs, allowing users to quickly and reliably detect errors in any design. TENCOR SP1 Surfscan DLS has a high resolution color imaging CCD camera for capturing images of the defects, a high-quality lighting machine that can be configured to accommodate various angles and heights for maximum accuracy, and an automated mechanical stage that moves the mask and wafers precisely when required for inspection. It also features several automated and semi-automated software tools such as E-field correction for line pattern repair and analysis, automated tools for surface imaging and defect evaluation, and automated pattern recognition, among others. Using SP1 Surfscan DLS, users can easily obtain a comprehensive view of the production process by creating customized process maps and overlaying product flows to monitor the performance of different production lines. The tool also supports multiple wafer detection and defect classification capabilities to ensure that each product is tested and inspected accurately and reliably. By using KLA / TENCOR SP1 Surfscan DLS, users can identify potential problems in the production process before they become serious and can therefore reduce costs associated with re-inspection, rework and repair. In conclusion, KLA SP1 Surfscan DLS is a powerful yet user-friendly mask and wafer inspection asset that helps ensure product quality and reliability. It features advanced algorithms and automated software tools to quickly and accurately detect errors, and customizable process maps and complementary product flows offer users a comprehensive view of the production process. Its user-friendly interface allows users to accurately and efficiently detect defects in masks and wafers during production, helping to reduce costs while improving product quality.
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