Used KLA / TENCOR SP1-TBI SURFSCAN #9097041 for sale

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ID: 9097041
Unpatterned surface inspection system Puck / vacuum handling Wafer measurement module Triple beam illumination (TBI) Normal illumination: 0.079 Defect sensitivity Oblique illumination: 0.060 Defect sensitivity Haze sensitivity: 0.005 ppm Ar Ion laser: 488 nm Measurement chamber with ULPA filter and blower unit Operator interface Microsoft windows NT 4.0 operating system Security, logging and native networking as provided by Windows NT Interactive pointing device Key pad controls Parallel printer port Defect map Histogram with zoom Micro view measurement capability Blower box Manual.
KLA / TENCOR SP1-TBI SURFSCAN is a state-of-the-art mask and wafer inspection equipment designed for use in microelectronic production. This semiconductor production system offers comprehensive surface defect detection capabilities, enabling users to identify the smallest defects on masks and wafers, with a size down to 0.02 microns. KLA SP1-TBI SURFSCAN comprises of several unit systems, including the Mask Inspection Unit (MIU) and Wafer Inspection Unit (WIU). The MIU provides advanced defect detection features and is a great choice for high-volume production. This unit permits highly precise sub-micron defect detection on Mask patterns, with an accuracy of up to 0.3 microns. The WIU offers additional features that permit defect checks on wire bonds and other external defects. In addition to its advanced defect detection capabilities, TENCOR SP1-TBI SURFSCAN offers a wide range of imaging options that enable it to inspect a variety of different features. These include feature size, aspect ratio, and line width/spacing. It also provides unique angle compensation and location tracking capabilities that allow it to accurately and quickly detect defects that are difficult to detect with conventional optical systems. SP1-TBI SURFSCAN is also capable of providing high-fidelity imaging solutions. This makes use of advanced algorithms that can render text, images, and patterns on masks with a great degree of detail. Furthermore, the unit allows for fast and accurate measurements on 3D wafers, with high resolution in-die features, providing reliable results for production line automation. Meanwhile, this machine offers powerful real-time defect analysis capabilities, with the option for users to save and analyze results on-the-fly. Overall, KLA / TENCOR SP1-TBI SURFSCAN is an advanced production tool that enables users to accurately identify defects on masks and wafers. It provides accurate measurements and high-fidelity imaging, with a great degree of detail and quality. Furthermore, it comes with robust defect detection features, aiding users in detecting even the smallest of defects down to 0.02 microns. With its flexible imaging options and powerful defect analysis capabilities, KLA SP1-TBI SURFSCAN is an ideal choice for semiconductor production lines.
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