Used KLA / TENCOR SP1-TBI SURFSCAN #9113669 for sale

KLA / TENCOR SP1-TBI SURFSCAN is a mask and wafer inspection equipment designed to detect both physical and electrical defects on patterned masks and wafers. The system consists of a high resolution, optical imaging unit, algorithmic defect review, and software control. The machine is capable of imaging up to 200 milliwatts of incident light to detect defects that are as small as 0.3 microns in size, and can detect rare defects that would otherwise not be visible. The tool utilizes a 20x magnification spectral imaging asset and a 10x objective lens to obtain the highest resolution defect inspection in its class. The model is able to detect both random physical defects, as well as electrical defects which may cause the electrical performance of the wafer or mask to become compromised. In addition, the equipment is able to detect any wafer-to-wafer and wafer-to-mask registration issues, allowing operators to quickly address any problems caused by steepy registration issues. The system includes a variety of proprietary algorithms which operates quickly and accurately to detect both physical and electrical defects on patterned masks and wafers. These algorithms are able to detect defects which may otherwise not be visible with standard optical imaging. The algorithms are designed to identify and measure defects for both mask-to-mask and wafer-to-wafer registration. KLA SP1-TBI SURFSCAN unit is designed to help clients identify any physical or electrical defects in a production process quickly and accurately. Additionally, the machine is compatible with a variety of industry standard inspection programs, allowing customers to easily integrate their existing systems into TENCOR SP1-TBI SURFSCAN platform. The tool is designed to provide users with fast, reliable defect inspection.