Used KLA / TENCOR SP1-TBI SURFSCAN #9117563 for sale

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ID: 9117563
Top part of operator user interface.
KLA / TENCOR SP1-TBI SURFSCAN is a sophisticated mask and wafer inspection equipment designed to ensure that extremely high yields and defect-free production are achieved. It offers a range of advanced capabilities to maximize efficiency and accuracy during the mask and wafer inspection process. Using innovative, advanced Imaging Technology (IT) algorithms, it is capable of quickly detecting defects down to 10 nm in size. The system utilizes powerful data integration capabilities, allowing for high-speed image analysis and fast automated defect-correction. The intuitive graphical user interface (GUI) makes it easy for operators to adjust settings, run inspections, and review results quickly and effectively. The advanced Color Mapping capabilities help to speed up the task of recognizing defects, and it is equipped with a unique Optimized Image Analysis (OIA) technology that allows for faster processing of defect data, helping to speed up the mask and wafer inspection process. To further enhance accuracy of its results, the unit incorporates Error Magnification analysis (EMA) technology, enabling it to effectively identify the smallest defects. Additionally, the machine is designed to be fully compatible with software such as KLA in-house VisionQC image analysis software, enabling quick and efficient data transfer between the two systems. Other features such as Image Pattern Clustering (IPC), a software-based defect identification algorithm, ensure operation remains efficient and accurate when cross-referencing image data. Overall, KLA SP1-TBI SURFSCAN mask and wafer inspection tool offers an impressive combination of automated inspection, analysis, and defect correction. Its advanced IT algorithms enable the detection of incredibly small defects, while its intuitive GUI and data integration capabilities ensure operations are performed quickly and accurately. It is a highly capable asset designed to increase the accuracy of mask and wafer inspections, while helping to maximize yields and ensure defect-free production.
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