Used KLA / TENCOR SP1-TBI SURFSCAN #9227710 for sale

KLA / TENCOR SP1-TBI SURFSCAN is an advanced mask and wafer inspection equipment used to identify and detect defects in integrated circuits. It is designed for automatic inspection of multiple front-end processing steps and provides detailed measurements of mask and wafer features to ensure continued yield improvement. The system is equipped with a sensitive optical subsystem that can detect and measure sub-micron features and defects on wafers and masks. It is available in either 4-pixel or 16-pixel configurations, and both feature a top-level Dual-Energy White-Light-Field technology that enables analysis of dual reflective- and transmissive-mode images at up to 90nm resolution. In addition, the unit is equipped with a patented Z-Stage Vacuum-Gap acquisition stage that performs fast and accurate measurements of surface features on all substrates. KLA has also incorporated their TrueBright™ Image Enhancement technology which further reduces the sensitivity threshold and increases the signal-to-noise ratio of detected defects. KLA SP1-TBI SURFSCAN allows users to quickly analyze wafer and mask information using a variety of algorithms. It is capable of identifying a wide range of defects including scratches, pores, voids, particles, particle walls, line-edge roughness, surface stains, and trenches. The advanced defect detection algorithms can detect process- or geometry-related defects down to 0.14um. The machine also provides several automated and customizable measurement functions, including critical dimension analysis, map traceability, and lot analysis. In addition, TENCOR SP1-TBI SURFSCAN is programmed to enable users to seamlessly integrate their existing wafer tracking software. The tool also includes a range of built-in tools for collecting, visualizing, and analyzing results. It can also be operated in automated production environments, allowing for fast and flexible performance evaluation and defect/parameter analysis. In short, SP1-TBI SURFSCAN is a comprehensive mask and wafer inspection asset that provides accurate and reliable defect detection and measurement capabilities. It offers a range of advanced optical and analysis features, and is designed to provide a fast, high-yielding, and accurate solution for ongoing defect and yield enhancement.