Used KLA / TENCOR SP1-TBI #293678701 for sale

KLA / TENCOR SP1-TBI is a mask & wafer inspection equipment developed for advanced semiconductor inspection and metrology. KLA SP1T-BI boasts several innovative technologies that enable it to detect even the smallest defects, such as line-edge roughness (LER) and process-induced variable line width (VLIW). This system is designed to give maximum yield, while also ensuring that the highest quality end-products are produced. TENCOR SP1 TBI integrates several advanced technologies to ensure maximum performance. This unit uses its multi-image sensor with patented beam enhancement to detect the smallest defects. SP1T-BI contains 8100 simultaneous readings, that are vertically aligned to allow for accurate detection. Moreover, KLA SP 1 TBI utilizes differential-gauge spectroscopy for superior throughput and more accurate results. The software platform of TENCOR SP 1 TBI is highly robust and features Auto-Tune technology. With Auto-Tune, SP1 TBI can automatically tune itself to the environment, making it quick and easy to set up. The software also allows users to customize their inspections and to monitor process events during the wafer or mask fabrication process. KLA / TENCOR SP1T-BI is designed with a patented Simul-Scan machine that cuts down run-time of inspection. This tool provides separately controlled dual optics, giving TENCOR SP1T-BI high speed and cost-efficiency. For example, with the Simul-Scan KLA / TENCOR SP 1 TBI can measure both stepper and inspection shots simultaneously, providing quicker results. In addition, SP 1-TBI ensures top quality results with built-in multiple defect detection thresholds. This adjusts the thresholds as well as detection algorithms, allowing the asset to identify a variety of defects with a greater degree of precision than previous versions of SP 1 TBI. With the ability to detect complex multiple defects, KLA / TENCOR SP 1-TBI consequently ensures a higher yield and faster rework cycles. KLA SP1 TBI is an advanced mask & wafer inspection model that is designed to provide maximum yield and quality assurance. Its combination of advanced technologies, such as the multi-image sensor, differential-gauge spectroscopy, and Simul-Scan equipment ensure rapid and accurate detection of even the smallest defects. Additionally, TENCOR SP1-TBI's software platform provides users with an intuitive interface and the ability to customize their inspections. With KLA / TENCOR SP1 TBI, users can rest assured that their mask & wafer inspections are as accurate as possible.