Used KLA / TENCOR SP1-TBI #9037347 for sale
It looks like this item has already been sold. Check similar products below or contact us and our experienced team will find it for you.
Tap to zoom
Sold
ID: 9037347
Wafer Size: 8" and 12"
Vintage: 2005
Single open cassette type
Vaccum chuck type
Software 4.1 Ver.
Particle counter, 8" and 12"
Single open cassette
Vacuum chuck type
Software: version 4.1
Laser and laser power supply
Triple beam illumination (TBI)
Wafer type: bare and film
Normal illumination: 0.079um defect sensitivity, oblique illumination, 0.06um defect sensitivity
0.005 ppm Haze sensitivity
Ar Ion laser (488nm)
RTDC (Real time defect classification)
Measurement chamber with ULPA filter and blower unit
Security, Logging and Native Networking
Key pad controls, TFT flat panel display
Parallel printer port
Defect map and histogram with zoom
Micro view measurement capability
Blower box
Currently de-installed
2005 vintage.
KLA / TENCOR SP1-TBI Mask & Wafer Inspection Equipment is an advanced wafer and mask inspection system designed for high speed photomask production. The unit uses two independent inspection channels on a single platform to provide high-quality wafer and mask inspection at up to 12 MHz. KLA SP1T-BI is designed for defect characterization and pattern verification on complex patterns of 6-inch or 8-inch photomask wafers. The machine is equipped with high-resolution cameras and optics to capture and analyze patterns on the photomask wafers. The tool also has a stage motion asset which allows XY scan of the surface of the mask and a two-axis tilt stage. The model is also capable of detecting various types of defects including: small pitch line defect, over etching defects, mis-hits, mis-matches, layer mis-alignments, unpatterned checkerboard patterns, under etching defects, and more. The equipment can accurately detect relevant wafer defects and recognise the wafer shape to identify the inspected. Using an HPC (High Performance Compute) system, TENCOR SP1 TBI unit can process multiple images simultaneously and quickly identify any lithographic errors. High-speed scanning and inspection are powered by fast scanning mapping and data processing. The machine features an automated defect categorization and grading process to quickly generate a detailed report. TENCOR SP1-TBI Mask & Wafer Inspection Tool is an ideal solution for high-end mask production. It offers improved reliability, accuracy and high speed inspection while enabling improved throughput as compared to any manual scanning process. The asset has a user-friendly interface to facilitate use for operators. Furthermore, the model utilizes sophisticated software to track, store, classify and analyse process batches. The equipment offers detailed reporting for various types of step and review operations to enable effective traceability. KLA / TENCOR SP1 TBI offers excellent overall performance with superior accuracy and unmatched speed. The system meets the needs of the most demanding production processes to ensure reliable cost-effective production.
There are no reviews yet