Used KLA / TENCOR SP1-TBI #9145376 for sale

KLA / TENCOR SP1-TBI is a mask and wafer inspection equipment designed to facilitate the rapid and accurate measurement of defect levels on wafers. The system offers high levels of performance and is well-suited to use in a wide range of applications, from semiconductor production to MEMS fabrication. The heart of KLA SP1T-BI is its 2D imaging technology. This technology allows it to detect small defects with high accuracy, at fast scanning speeds. It is equipped with an ultra-fast, 12-megapixel low density CMOS detector, which enables it to capture high-resolution images in real-time, enabling it to detect subtle changes in the mask and wafer profile. The unit also features integrated sophisticated image processing and analysis algorithms, such as 3D image analysis, which can measure mask and wafer topography, reveal defects in the pattern, and quantify the nonuniformity of a pattern's features. Additionally, the machine is capable of providing quick feedback on critical process control parameters, such as registration offsets and placement accuracy. This makes the tool ideal for process development and process monitoring applications. TENCOR SP1 TBI has been designed to provide a flexible, comprehensive solution for mask and wafer inspection needs. Its modular design makes it easy to integrate into existing manufacturing processes, and its user-friendly graphical interface and intuitive operation make it easy to use. Furthermore, due to its reliability and accuracy, it is well-suited for use in long-term production runs. It also features advanced process control, audit trail, and diagnostic capabilities that enable it to stay within calibration parameters and to detect and report any irregularities. Overall, KLA SP1 TBI is an advanced imaging asset that provides the fast, accurate, and comprehensive imaging capabilities that are essential for mask and wafer inspection. With its high-performance imaging technology, sophisticated image analysis algorithms, and comprehensive process control and audit trail capabilities, the model is an ideal choice for both research and production.