Used KLA / TENCOR SP1-TBI #9217879 for sale

KLA / TENCOR SP1-TBI Mask and Wafer Inspection Equipment is an automated system designed to detect and analyze defects on 3D micro-fabricated masks and wafers. The unit offers a comprehensive set of mask and wafer inspection capabilities that can be used in a wide variety of sectors within the semiconductor industry, such as automated test equipment, advanced packaging, MEMS manufacturing, and other IC manufacturing processes. KLA SP1T-BI mask and wafer inspection machine features an advanced mask inspection algorithm to detect defects. This algorithm features a three-dimensional (3D) model-based pattern recognition technology, which enables users to quickly and accurately analyze defects on masks and wafers. This tool is capable of detecting both small and large defects, from feature misalignments and masking errors to broken or missing features. The asset is also capable of acquiring high-resolution images of the masks and wafers using a five megapixel camera for full field of view imaging. This provides users with a comprehensive list of results with detailed positional information for each defect. This model uses an automated stage control, which enables users to easily move the sample across the field of view. In addition, the equipment includes a powerful sizing and feature classification capability that can differentiate different types of defects. This feature provides users with a comprehensive list of results with defect distributions and types for fault analysis. This system also includes a powerful image processing suite to enable fast defect evaluation and to alleviate human fatigue. Furthermore, TENCOR SP1 TBI mask and wafer inspection unit is equipped with an intuitive graphical interface to simplify operation. This interface is designed to optimize user efficiency, improve defect review accuracy, and enable efficient and repeatable results. This user-friendly interface also provides users with a visual indication of problem areas, which allows users to select specific defect regions for review. Overall, KLA SP 1-TBI mask and wafer inspection machine delivers high performance and reliable defect detection to enable the highest levels of semiconductor device yield and reliability. This tool offers users an advanced and complete solution for mask and wafer inspections with the combination of its advanced algorithm, high-resolution imaging, automated stage control, sizing and feature classification capabilities, and user-friendly interface.