Used KLA / TENCOR SP1-TBI #9226564 for sale

KLA / TENCOR SP1-TBI is a high-performance mask and wafer inspection equipment designed to meet the demanding requirements of semiconductor manufacturers worldwide. With an advanced, dedicated ultra-violet laser, KLA SP1T-BI delivers fast, accurate measurements of critical geometries required to ensure advanced process control. The system is designed to provide superior surface, critical parameters and overlay measurements, as well as feature sizes correlated to high-volume process nodes. It integrates a variety of imaging, sensing, and laser tools, providing an advanced combination of stitching and stitching acuity for failure diagnostics. TENCOR SP1 TBI is designed with the highest level of productivity in mind, featuring a 250 mm scanner platform with fast, reliable wafer handling, and high-speed stitching capability for efficient pattern and alignment investigation. The unit also includes a robust suite of analysis and data-processing tools to support automated production and quality control processes. The machine is designed to support a wide variety of inspection and review tasks, including advanced process control requirements for different types of structures. Utilizing the best in proven optical technologies, such as bright-field, dark-field, and phase contrast imaging, TENCOR SP 1 TBI offers enhanced high-resolution imaging to accurately identify even the smallest defects. The tool also features powerful wafer alignment capabilities for improved speed and accuracy. It works to automatically detect and quantify any substrate overlay error or texture issues with precision, and includes a variety of advanced software features that support both on-line and off-line measurements. Furthermore, TENCOR SP1T-BI runs a number of advanced wafer-level measurements and inspection solutions, such as advanced pixel-level defect inspection, OCR technologies, and support for a variety of patterning technologies. Its enhanced stability capabilities enable definitive measurement results on a wide variety of substrates, from photomasks to wafers. In addition, KLA SP1 TBI offers advanced process control capabilities, allowing for real-time measurement and alignment feedback. Its advanced control and capability profiling increase flow and throughput, enabling improved yield and decreased waste. Overall, KLA SP 1 TBI is a powerful and reliable mask and wafer inspection asset that offers superior imaging, sensing, and laser capabilities for accurate results. With its robust software features and advanced process control capabilities, KLA / TENCOR SP1 TBI is essential for a variety of quality control and engineering tasks. KLA / TENCOR SP 1 TBI is the ideal choice for semiconductor manufacturers who need reliable, fast, and accurate results.