Used KLA / TENCOR SP1-TBI #9230385 for sale

KLA / TENCOR SP1-TBI is a next-generation mask and wafer inspection equipment that has been developed to meet the high-precision requirements of semiconductor chip production. The system combines advanced imaging technology, advanced algorithms, and a suite of data preparation and analysis tools that allow for ultra-high accuracy wafer and mask inspection throughout the entire production process. KLA SP1T-BI utilizes a suite of optical imaging technologies, including extreme ultraviolet lithography (EUVL) inspection with charged coupled device (CCD), electron beam inspection with scanning electron microscopy (SEM), and micron-scale inspection with laser scanning confocal microscopy (LSCM). Each of these technologies is designed to detect defects with the greatest possible accuracy and smallest footprint. Additionally, the unit features a laser-based optical depth power probe (ODPP) for surface height measurements, and an eddy current imaging probe (ECIP) for orientation, depth and curvature measurements. The machine also includes advanced optics and algorithms for real-time data acquisition and analysis. It uses a variety of techniques, including adaptive optics, opto-electrical defect mapping, texture mapping, and pattern recognition algorithms, to analyze the images and detect defects that may affect the reliability and performance of the device. TENCOR SP1 TBI also features advanced automation technologies that make it easier to integrate it into existing wafer and mask inspection processes. It is designed to ensure fast set-up time, reliable tool operation, and fast defect detection. It is also capable of controlling the wafer and mask inspection environment, ensuring a safe and consistent production environment. The asset is also designed to provide a high level of performance and efficiency. Its data acquisition and analysis tools allow for fast and accurate detection of defects throughout the entire device production process. It is also an ideal solution for high-precision mask and wafer inspection jobs, as its algorithms are optimized for defect detection with the highest accuracy. Overall, TENCOR SP1-TBI is an advanced mask and wafer inspection model that is designed to meet the most demanding requirements of semiconductor chip production. Its advanced imaging, automation, and data analysis technologies provide fast and accurate defect detection, while the suite of tools and data manipulation capabilities allow it to be easily integrated into existing processes. It is an ideal choice for high-precision mask and wafer inspection jobs.