Used KLA / TENCOR SP1-TBI #9248729 for sale

KLA / TENCOR SP1-TBI Mask & Wafer Inspection Equipment is an automated, precision tool for quality control and defect analysis of semiconductor wafers during the manufacturing process. This system enables operators to quickly and accurately analyze areas of the wafer surface for defects, impurities, contamination or other irregularities. KLA SP1T-BI provides high-resolution imaging, powerful analytics, and flexible user interface as well as a number of analysis tools and powerful imaging workflow. The unit comprises sophisticated hardware and software that facilitate high throughput, extremely fast image capture, and precise pattern recognition. It contains: a bright, clear image viewing machine; an optical stage that enables rapid and precise sample alignment; two full-field cameras that capture images at high resolution and multiple settings; and an interface between the PC and the tool in order to provide visualization, storage, and data management. The asset also includes a range of analysis tools. It provides three primary defect categories: foreign particles, general defects, and anomalous features. Additionally, operators can access three plane mapping techniques: Multi-angle Illumination Dark-field (MIDF), Normal Illumination Dark-field (NIDF), and Phase Shift Defect Detection (PSDD). This allows for an array of compositional and/or structural pixel-level defect recognition. The analysis tools offer an intuitive user interface to combine automatic and manual analysis. Automated sampling is another aspect of TENCOR SP1 TBI. Sampling can be configured by the user according to application and site specific requirements. It automatically aligns and acquires images at up to 5,000 wafers per hour and is capable of detecting defects down to 6nm. Additionally, it can remove wafers with severe damage, virtually eliminating rejected wafers. KLA / TENCOR SP1 TBI also offers a number of interfaces to multiple data management systems, enabling operators to efficiently transfer and share critical production information. This helps ensure quality control of wafers in production line. In summary, KLA SP1-TBI Mask & Wafer Inspection Model provides a versatile and cost-effective tool for semiconductor wafer inspection. It provides precise imaging and defect detection capabilities in combination with automated sample alignment; its intuitive user interface offers a range of analysis tools and interfaces to data systems - all in order to reliably guarantee quality control of wafers during the manufacturing process.