Used KLA / TENCOR SP1-TBI #9254918 for sale

KLA / TENCOR SP1-TBI is a mask and wafer inspection equipment that combines high-resolution imaging with sophisticated pattern recognition algorithms to detect defects on semiconductor wafers and reticles. It offers an unsurpassed throughput of 200 wafers per hour (WPH) with a top-level accuracy of 4 nm. The system employs a 0.75-1.0µm high-resolution laser imaging unit for both offline and online applications. It is designed for defect detection and review, allowing the operator to share large image files quickly with colleagues for enhanced collaboration. KLA SP1T-BI ensures consistent, reliable defect detection across a wide range of feature sizes. The wafer imaging uses a deep-UV laser or a conventional source, ensuring that masks and other materials are imaged without the need for additional optics or exposure systems. The machine is also equipped with advanced defect classification capability, which allows users to focus their review on defects of interest, while isolating routine defects. The tool includes dedicated pattern matching software to detect critical defect features, including nanostructures and features as small as 4nm, with exceptional speed and high accuracy. The pattern matching algorithm uses a proprietary set of templates and parameters to identify a large variety of defects using differential edge enhancement. TENCOR SP1 TBI also features advanced defect detection, classification, and analytics capabilities. These include automated defect collection, quantitative defect metrology, data visualization and reporting. The asset includes adaptive data post-processing tools, which enable users to refine the inspection results and quickly identify, classify, and report defects. The intuitive user interface allows operators to customize the model for specific applications. The user-friendly touch panel interface provides real-time feedback on equipment performance, making it easy to adjust the settings and quickly diagnose any potential issues. TENCOR SP 1 TBI provides the industry's most advanced mask and wafer inspection system. Built for high-volume production lines, the unit ensures fast, precise, and accurate defect detection, ensuring that the yield of your production line remains consistently high.