Used KLA / TENCOR SP1-TBI #9257956 for sale

KLA / TENCOR SP1-TBI is a wafer and mask inspection equipment that provides a reliable and cost-effective approach for automated optics-based process monitoring and defect detection. This system is ideal for inoNode process control in advanced semiconductor manufacturing environments, making it suitable for a wide range of device types. KLA SP1T-BI is designed to meet the demanding requirements of mask and wafer inspection. It is equipped with a 4K high-resolution optical microscope and proprietary optics-based control systems for advanced imaging and defect analysis. Additionally, the unit allows for automatic generation of high-resolution images and runs comprehensive autofocus algorithms in order to optimize image resolution at extremely fast scanning rates. TENCOR SP1 TBI integrates advanced image processing algorithms that enable it to detect a number of defect types, including pattern defects, fabrication defects, etc. Additionally, the machine is capable of recognizing a wide range of dielectric layers, making it suitable for advanced process monitoring. Furthermore, the tool supports selective etch inspection and measurement of over/under exposure for a variety of process steps. The software component of TENCOR SP1-TBI provides a user-friendly interface and powerful data-analysis capabilities. It has a wide range of imaging modes that enable accurate image capture with fast scan speeds, as well as support for various processing techniques. The asset also features real-time defect tracking mode and automatic defect classification. Furthermore, the software can generate detailed electronics performance maps (EPMs) for various layers and structures. SP1-TBI also includes process-control options for closed-loop control systems, allowing for adjustments and corrections during the manufacture of wafers and masks. These process-control options also enable integration and data sharing with other parts of the manufacturing process. Overall, SP1T-BI is an ideal solution for optical-based process monitoring and defect detection. It is highly reliable and cost-effective, and provides a comprehensive and user-friendly platform for a wide range of wafer and mask inspections. With its advanced imaging and defect-detection capabilities, as well as powerful software and process-control options, KLA SP1-TBI is the perfect tool for advanced semiconductor manufacturing.