Used KLA / TENCOR SP1-TBI #9266303 for sale

KLA / TENCOR SP1-TBI is a self-contained, semi-automatic mask and wafer inspection equipment that utilizes Contact Image Sensors (CIS) to recognize faults associated with mask and wafer processing. The system is designed to perform fast and accurate detection of defects in various masks and wafers, as well as particle detection from submicron to millimetric. The unit has a five-inch non-contact optical stage for loading and unloading of the mask or wafer. Once loaded, the stage moves with respect to the CIS beams to generate a digital signal representation of the mask or wafer surface. The hundreds of thousands of signals generated is compared side-by-side with the original scanned data to detect any defects. KLA SP1T-BI also features an automated defects classification machine that is able to distinguish between particles, scratches and other random defects and segment them accordingly. Additionally, the tool is capable of detecting chip/via faults, resist residue, nodes, and wires and traces. The accuracy and speed of the asset is maintained through an advanced image registration algorithm. The user experience is enhanced by a variety of features that allow for easy manipulation of the physical sample. The model offers two ways of selecting a region of interest (ROI): manual selection and automatic alignment. The manual selection allows users to select any region of interest and start the inspection process; while the automatic alignment mode selects the ROI from a reference image that is pre-stored into the equipment. With any mask or wafer inspection process, the quality of the results depend on the uniformity of illumination applied to the sample. TENCOR SP1 TBI employs a uniform programmable illuminator to create a uniform illumination field. The illuminator is programmable to allow the dynamic selection of different wavelengths, enabling a variety of sample defects to be treated independently. In conclusion, SP1 TBI is an efficient and reliable system for accurate, automated mask and wafer inspection. The unit has an image registration algorithm along with a uniform programmable illuminator, as well as an automated defects classification machine, making it an ideal choice for high-throughput mask and wafer inspection applications.