Used KLA / TENCOR SP1-TBI #9354265 for sale

KLA / TENCOR SP1-TBI is a highly sophisticated and advanced equipment for mask and wafer inspection. It utilizes high-speed optics and 2-D image processing technology to detect the presence of defects in these materials. The mask and wafer inspection system offers fast sample-to-sample scanning speeds so that parts can be inspected rapidly and accurately. The unit is able to inspect both mask layers and wafers for defects with high precision. It utilizes a dual-lens optical machine with two magnification levels to provide detailed analysis. The tool has the capability of both automatic and manual image acquisition and analysis processes. It is also equipped with a host of software features, such as defect classification, defect size and location measurement, and auto-alignment of images. The asset can perform review scans for in-line inspection of substrates. Its retractable image board provides flexibility for automated or manual comparison of results. It also offers advanced photo-metric analysis, which can detect differences in the latitudinal and longitudinal lines of the pattern on the mask layer. In addition, the model has a built-in microscopic camera that is used to analyze a sample at sub-micron resolution. KLA SP1T-BI features built-in image capture and processing capabilities, which provide high accuracy and repeatability. The equipment is also able to handle overflows and incomplete images. It supports a large number of data formats and can be integrated with existing IT networks and systems. The system ensures that mask layers and wafers are of the highest quality by delivering repeatability, accuracy, and integrity. Its advanced optics, high-precision analysis capabilities, and flexibility make TENCOR SP1 TBI an ideal unit for mask and wafer inspection in mass production.