Used KLA / TENCOR SP1-TBI #9401034 for sale

KLA / TENCOR SP1-TBI is an automated mask and wafer inspection equipment designed to inspect and detect defects on Patterned Wafers, Step and Repeat (Stencil) Masks and Photomasks. It uses sophisticated optical, absorptive and pattern recognition capabilities to achieve extremely high inspection sensitivity and accuracy. The core of KLA SP1T-BI system is an integrated software and hardware platform optimized to quickly and reliably inspect the surfaces of both patterned wafers and masks. It includes the 5-megapixel SP1-C inspection camera, which employs advanced optical technology to capture detailed images of both defects and flawless surfaces. The SP1-C optical technology provides superior sensitivity and accuracy for detection of features as small as 0.3 μm. It also features a high-speed image acquisition rate, allowing for rapid inspection of samples. The unit also utilizes an array of inspection software components and powerful processors to meet the challenges of advanced process control requirements. In particular, the Mask Plane Rating software is designed for reliable detection and measurement of line widths, spaces, and other edge features, making it ideal for identifying non-uniformity errors in masks and wafers. TENCOR SP1 TBI machine's imaging software also uniquely provides input to automated defect review tools, enabling fast and efficient review of defect locations, automatic confirmation testing, and automated defect classification. Additionally, the tool includes advanced optimization algorithms that enable it to rapidly identify areas of interest and prioritize those areas for intensive inspection. SP1 TBI asset is compatible with a variety of flexible configuration options and peripheral tools, such as the AutoZone software, which ensures easy alignment and configuration of the model. Furthermore, the equipment offers the ability to generate real-time feedback for mask and wafer fabrication and process engineers, enabling rapid assessment of process and practical co-design solutions. In conclusion, SP1T-BI automated mask and wafer inspection system offers an impressive range of advanced capabilities, improved accuracy, and rapid process control assessment, making it the ideal choice for patterned wafer and mask inspection and detection.