Used KLA / TENCOR SP1 #87226 for sale
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ID: 87226
Classic wafer surface inspection system, 12"
Cassette to Cassette
Software Version: 3.30.1829
Power Requirements: 208/240 V, 24.0 A, 50/60 Hz, 1 Phase
Argon Ion Laser: 488nm
Measurement Chamber with ULPA Filter & Blower Unit
Operator Interface MS Windows NT 4.0
Interactive Pointing Device
Keypad Controls
TFT Flat Panel Display
Parallel Printer Port
Defect Map and Histogram with Zoom Micro View Measurement Capability
X-Y Coordinates
0.18 um Process Technologies & Beyond
0.08 um Defect Sensitivity on Well-Polished Silicon
95% Capture
Up to 150 Wafers per Hour Throughput on 12" Wafers
Brooks Automation Fixload
12" Load Port for FOUPS
Working condition
1997 vintage.
KLA / TENCOR SP1 is a high-precision, automated mask and wafer inspection equipment. KLA SP1 system is designed to detect, analyze and report on any defects present on the mask and wafer surfaces. The unit incorporates leading-edge vision technologies, along with advanced pattern-matching and imaging techniques, to ensure high-accuracy, repeatable, and reliable inspection results. It provides a comprehensive suite of capabilities: critical defect detection, spatial analysis, image archiving and advanced defect classification. TENCOR SP 1 machine utilizes state-of-the-art optical detection technology, including UV illumination and a dual-wavelength confocal microscope, to accurately detect and analyze defects on the mask and wafer surfaces. The tool is designed to capture up to 8 image frames, at resolutions up to 300nm. The asset also features a high-definition camera with six multispectral viewing channels. The model offers four distinct defect modes to inspect different types of defects, including "visual" (surface-level defects such as bumps, strike-throughs, blistering, etc.), "structural" (subsurface defects such as voids, delaminations, etc.), "catastrophic" (cause large-scale process anomalies) and "prediction" (enable users to anticipate potential future defects). KLA SP 1 includes a variety of metrics, such as defect size, shape and position. An automated defect classifier enables the equipment to distinguish between different types of defect, ensuring that only valid (non-false positive) defects are reported. This helps improve accuracy and reduce false alarms. Finally, KLA / TENCOR SP 1 system supports advanced reporting capabilities. The unit uses powerful analytics to generate graphs and other summary statistics that can be used to improve production processes. Reports can be tailored to meet specific needs, allowing manufacturers to gain insight into important process performance metrics. In summary, SP1 is an advanced mask and wafer inspection machine that offers a comprehensive suite of capabilities. It utilizes leading-edge optics and defect classification technology to enable high-accuracy, repeatable, and reliable defect detection, analysis and reporting. The tool can be tailored to meet the specific needs of any production process, helping manufacturers gain valuable insight into their operations.
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