Used KLA / TENCOR SP1 #9024558 for sale

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ID: 9024558
Wafer Size: 8"-12"
Chuck, 8"-12".
KLA / TENCOR SP1 is a state-of-the-art mask and wafer inspection equipment that enables advanced circuit inspection and analysis with unparalleled accuracy and precision. Utilizing a dual-view optical system composed of two digital cameras, KLA SP1 offers Inspection, Metrology, Defect Classification, OCR and several other functionalities that make it the perfect tool for process control and yield optimization. Its intuitive, easy-to-use software comes with a wide range of features and settings, allowing users to customize the unit according to their specific needs. TENCOR SP 1's Inspection feature allows the detection and identification of numerous circuit defects, such as scratches, opens, shorts, bridging, cracks, false geometries, and etc. Using advanced laser beam steering, KLA SP 1 can accurately locate anomalies and display them clearly with visual markers. With the Metrology feature, more complex measurements and analysis can be performed, such as the assessment of overlay accuracy or surface roughness. The Defect Classification feature uses a custom algorithm to detect and classify defects, which can then be displayed with either pass/fail indicators or collected into data sets for statistical evaluation. The OCR feature is perfect for comparing character shapes and sizes while evaluating overlay grids. SP 1 also comes with a user-friendly graphical interface that offers a variety of viewing options. Image data can be displayed in various ways such as contour plots, wire frame, or overlay grid, and can be analyzed from different angles. A dedicated analysis suite enables users to create sophisticated data queries and perform detailed image comparison for precise defect analysis. All in all, SP1 is a powerful solution for the task of mask and wafer inspection, capable of detecting a broad range of defects with superior accuracy and precision. Advanced analytics and custom user settings make this machine perfect for fast and effective process control and yield optimization.
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