Used KLA / TENCOR SP1 #9097785 for sale

KLA / TENCOR SP1 Mask and Wafer Inspection Equipment is a highly precise and reliable automated inspection system for mask and wafer applications. It is used throughout the semiconductor industry to ensure the quality and accuracy of optical, reticle, and wafer features. KLA SP1 utilizes advanced laser-optical sensing technologies to detect and identify critical dimensions, edges, fiducials, and other features. In order to ensure accuracy and repeatability, it also incorporates specialized defect detection algorithms to detect anomalies in the requested features. Additionally, it has the ability to detect pattern anomalies, bridging, dopant contamination, line width variances and several other parameters. TENCOR SP 1 offers users high resolution and accurate results, with comparison capabilities up to 1/25,000th of a millimeter. Its unit precision accuracy is up to 3 µm (0.003mm). To safeguard that accuracy, it incorporates several inspection components, such as Auto Focus, Digital Zoom, and Global Illumination; additional features such as the Sensitivity Equalizer, allow users to set the correct thresholds and sensitivity for optimal inspections. With an experienced and user-friendly graphical interface, it makes operation simple for users, who can compare multiple wafer or mask images side by side for easy visual confirmation. In addition, a built-in statistical analyser evaluates the results of each inspection, giving users greater confidence about their results. KLA SP 1 also comes complete with report generation and export capabilities as well as machine-to-tool networking and networking options, making it easy to integrate into a production environment. It is also designed to conform with global safety requirements, data security, and ESD standards, giving users peace of mind. Overall, SP 1 Mask and Wafer Inspection Asset is an advanced and reliable inspection tool for the semiconductor industry, offering high accuracy and precision inspection to help ensure quality and accuracy of not just wafers and masks, but other critical components as well.