Used KLA / TENCOR SP1 #9202637 for sale

KLA / TENCOR SP1 is a mask and wafer inspection equipment that offers a broad range of inspection capabilities to improve the quality of semiconductor fabrication processes. This system includes advanced technologies for high resolution imaging, high throughput performance, total pattern inspection, automated defect review, and data analysis. KLA SP1 offers a wafer-level defect review for rapid defect localization, and a wide range of imaging techniques to meet both customer and industrial standards. TENCOR SP 1 utilizes high-resolution imaging (HRI) techniques to provide superior defect inspection capability. HRI technology is based on the principle that atoms absorb light waves differently, depending on their chemical structure. By combining two beams of light to produce a high-magnification image, TENCOR SP1 can detect the unique contrast between atomic bonds. This allows it to detect the presence of tiny defects, such as particle debris or variances in layer thickness. SP1 also features specialized pattern-recognition algorithms and specialized software to rapidly detect, classify, and analyze defects. These algorithms filter objects in a layer according to their shape, size, or position. Defects can be identified and classified with the highest level of accuracy. The software can also generate data summary reports, which can be used to detect trends in a particular process or layer of a semiconductor. KLA SP 1 also provides total pattern inspection (TPI) capabilities. TPI is a technique that allows the unit to scan an entire pattern, detecting all possible defects. Using an integrated microscope, the machine can perform a full-field scan, mapping the entire pattern with instant feedback. This helps prevent unreported errors and reduces the complexity of diagnosis and repair tasks. Finally, SP 1 is designed for high-throughput performance. It processes large amounts of data at a rate of 250 wafers per hour. This ultra-high speed allows it to quickly detect and analyze defects in multiple layers simultaneously. In conclusion, KLA / TENCOR SP 1 is an advanced mask and wafer inspection tool that offers excellent performance and unsurpassed defect detection capabilities. It provides high-resolution imaging, pattern-recognition algorithms, and total pattern inspection capabilities to ensure precise defect detection. In addition, the asset offers high-throughput performance to keep up with the high demands of the semiconductor industry.