Used KLA / TENCOR SP2 XP #9195049 for sale

KLA / TENCOR SP2 XP is a mask and wafer inspection equipment that offers superior optical performance and industry-leading measurement accuracy for high accuracy research, development, and manufacturing use. Its state-of-the-art optical design provides superior image capture and advanced defect detection capability for semiconductor mask and wafer inspection. It also provides an intuitive operator interface and automated programs for quick, repeatable results and ease of operation. KLA SP2 XP system is specifically designed for superior optical performance and inspection accuracy, providing higher-resolution imaging with full depth of field illumination and a 10X larger field of view compared to similar systems. This allows users to detect very small defects and variations in structures while avoiding false positives. TENCOR SP2-XP features an integrated scanning unit consisting of a 533 nm solid-state laser, a fast moving beam over the entire wafer, and a CCD detector for real-time image capture. It also includes a comprehensive suite of software tools for condition assessment, defect low contrast detection, and defect detection providing users with the ability to detect very small and difficult-to-see defects while avoiding spurious results. SP2-XP is designed to meet the most demanding requirements for semiconductor wafer and mask inspection. It has a high-accuracy stage machine for nanometer-level stage control in both scan and non-scan modes, and advanced motor control for ultra-fast scan uniformity and precision. The tool also offers an interactive user experience, with an intuitive GUI and automated programs for quickly and easily detecting and isolating defects. Real-time defect detection can be accomplished in two modes: in-scan-nonstop and auto-detect-nonstop, which provide even more flexibility and time savings. KLA / TENCOR SP2-XP is a cost-effective solution that simplifies the process of inspecting wafer and mask patterns. With its superior performance and comprehensive feature set, it is the ideal choice for mask and wafer inspection in research, development, and manufacturing.