Used KLA / TENCOR SP2 #9138110 for sale

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ID: 9138110
Wafer Size: 12"
Vintage: 2012
Surface inspection system,12" Dual FIM /FOUP Vacuum puck handling Wafer measurement module Optimized sensitivity Throughput < 37 nm defect sensitivity on polished bare silicon Enables qualification of current Next Generation Substrates SOI, Strained SOI Strained Si UV Laser illumination Defect map Histogram with zoom IMicroview measurement capability Real-time defect classification (RTDC) Can be upgraded to SP2 XP at additional cost Microsoft XP operating system Blower box 2012 vintage.
KLA / TENCOR SP2 is an advanced mask and wafer inspection equipment specifically designed for assessing mask and wafer quality. This cutting-edge system utilizes a combination of proprietary optical imaging, defect detection, and advanced analytics to guarantee a comprehensive and accurate inspection. KLA SP-2 is capable of performing a range of automated tasks, such as fine line image assessment, defect detections, and leveraging the large number of sensors which are embedded within all leading-edge lithography techniques. It is able to analyze the thickness of film layers, identify critical dimensions of device features, and perform other critical metrology functions. Additionally, the unit is able to monitor the uniformity of process results and evaluate the quality of parts with optically smooth surfaces. TENCOR SP 2 features advanced pattern recognition functionality, providing users with an effective and efficient means for identifying susceptible defects. Insufficient part quality can be identified, with the machine able to detect contaminants, defects, and other material irregularities which can lead to a reduction in serviceable components produced. KLA / TENCOR SP 2 tool is capable of providing in-depth data collection, providing a real-time picture of the process in action. Additionally, the asset is capable of facilitating defect scalability analysis, allowing the evaluation of process trends in order to allow the improvement of yield rates. All data collected is stored and can be easily retrieved, ensuring that users are able to effectively and accurately make data-driven decisions. SP-2 is widely regarded as innovative mask and wafer inspection model. Utilizing proprietary optical imaging and advanced defect detection, it is capable of providing users with an accurate and comprehensive overview of process results. It is an invaluable tool which can facilitate improved production efficiency and yield rates.
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