Used KLA / TENCOR SP2 #9167412 for sale

KLA / TENCOR SP2 is a mask & wafer inspection equipment that provides high-speed, high-resolution imaging of semiconductor mask and wafer surfaces, enabling highly sensitive defect detection. The system is capable of scanning one or two full wafers per scan, with the ability to switch between individual wafer scans and full wafer inspections. This unit has four major components - a light source, a camera, an optics chamber, and a custom imaging software. The light source is a custom LED array consisting of three different wavelengths. This configuration provides uniform but high-intensity illumination, meaning that image quality remains consistent throughout different exposure conditions. The camera for KLA SP-2 is a back-illuminator CCD imaging array. It is designed to maximize sensitivity to different levels of mask transparency and reflectivity. This allows for high-contrast imaging, giving the machine the ability to detect a wide range of defects and other characteristics of the sample surface. The optics chamber filters out unwanted low-level light sources from the camera and image, while also providing effective focus for the camera. Coupled with the unique illumination setup of the tool, this optics chamber also serves to control the depth of field of the asset, allowing the user to select a shallow or a deep depth of field depending on the application. Finally, TENCOR SP 2 software is designed to process the images produced by the model quickly and accurately. It includes a variety of image processing algorithms, including defect detection, auto-stitching, image registration, and aberration correction. The software also allows users to further customize their analysis, enabling them to apply specialized algorithms to specific patterns or features on the sample surface. Overall, KLA / TENCOR SP-2 is an extremely powerful mask & wafer inspection equipment that provides users with accurate and high-resolution imaging of their semiconductor samples. With its versatile optics chambers, efficient LED illumination array, and advanced image processing algorithms, the system is capable of detecting a wide range of defects and features down to the sub micrometer level.