Used KLA / TENCOR SP2 #9199155 for sale

KLA / TENCOR SP2 is a mask and wafer inspection equipment designed to provide extremely accurate micro-scale surface measurements and defect detection capabilities. Using advanced scanning and imaging technology, the system is able to resolve even the smallest surface features and defects with precision. KLA SP-2 utilizes a high-performance CCD camera operating in the visible range of 400-950 nanometers. A high resolution lens is used to capture the images, which is then processed by powerful image-processing algorithms. These algorithms detect unfamiliar features, such as 'foreign particles', dislocations, scratches, and other surface defects. The images are then stored for further analysis. The unit puts great emphasis on speed and accuracy when scanning and measuring samples. It has a scanning speed of up to 5 million pixels per second, which translates to a maximum scan rate of 200 wafers per hour. A variety of multiple-axis chucks can be used to support large samples, and a PCI/SCSI Interface allows remote control and processing of samples. The machine can also be upgraded with advanced lenses and additional software options for increased versatility. For example, the multi-point planar scanning option allows TENCOR SP 2 to quickly inspect large areas at once. Additionally, extended dynamic range functions enable high-precision measurements and the use of specialized software, such as multi-zone overlay capability, provide highly accurate defect detection. KLA / TENCOR SP-2 is an advanced mask and wafer inspection tool that can process a large number of samples quickly and accurately. With its high-resolution imaging capabilities and multiple software options, SP-2 ensures accurate defect detection and highly precise measurements. This asset is an ideal choice for top-level quality inspection in semiconductor production.