Used KLA / TENCOR SP2 #9232738 for sale

KLA / TENCOR SP2 is a mask and wafer inspection system designed for use in semiconductor manufacturing. Utilizing advanced Single Photon counting technology, KLA SP-2 provides a comprehensive defect detection and inspection solution for both masks and wafers. TENCOR SP 2 consists of a dedicated mask inspection subsystem and wafer substrate inspection subsystem. Each of these subsystems is equipped with integrated imaging, imaging scanners, illuminators, and software for defect analysis. The imaging scanners allow for high resolution imaging with dynamic focus and curvature measurement capabilities, allowing for high accuracy of image comparison. The illuminators provide highly accelerated illumination, enabling maximum inspection speed and optimizing defect detection. SP2 also features advanced imaging software for automated defect detection and defect classification. These software applications are designed to identify common types of process-development and defect-related abnormalities, as well as defects caused by improper fabrication or devices errors. Additionally, the imaging software is compatible with both SEM and TEM imaging technologies, allowing for fast and accurate defect detection. To maximize throughput, SP-2 features a multi-slice, fully automatic scan capability. This automated scanning capability allows multiple mask/wafer slices to be inspected and analyzed simultaneously, enabling significantly increased inspection speeds and improved mask/wafer defect coverage. KLA SP2 also includes an integrated user interface for mask and wafer characterization. This user interface provides efficient visualization, comparison, and analysis of images, allowing users to quickly review and optimize the mask/wafer for production. Additionally, the system comes with an array of statistics, image manipulation, and analysis tools, to ensure maximum process control and product reliability. Finally, TENCOR SP-2 system includes an advanced data logging and statistics tool which provides detailed logging and analysis of defect types and sizes. This feature allows for pinpoint analysis of defects, enabling detailed root cause analyses and improved decision-making in the production process. Overall, TENCOR SP2 provides an ideal solution for mask and wafer inspection, offering comprehensive defect detection and characterization capabilities in an automated and efficient manner.