Used KLA / TENCOR SP3 SURFSCAN #9238001 for sale

KLA / TENCOR SP3 SURFSCAN is a highly advanced mask and wafer inspection equipment. It is the premier system for the inspection and analysis of photomasks and wafers of all sizes. This inspection unit utilizes advanced optical beam scanning techniques and sophisticated algorithms to detect defects ranging from microns in size down to nanometers. Additionally, the machine provides full-field defect analysis and defect classification consistent with industry standards. The key feature of this tool is its advanced optical beam scanning capabilities. This asset uses a beam of light to inspect masks and wafers and detect any anomalies. The beam scans in a linear fashion and is capable of detecting defects smaller than 5 microns on a single pixel. This scan rate is much higher than that of traditional scanning electron microscopes, allowing for more comprehensive defect detection. The model's sophisticated algorithms then go on to identify,-and classify any defect that is detected. It analyzes the images and divides defects into two categories: darksides and lightsides. This classification helps operators see thetfaftest and identify potential causes. In addition to providing defect detection and classification, the equipment can also be used for a variety of post-scan defect analysis. It includes options such as library-based smart defect analysis and statistical measurements of defect size, location, morphology, and defect history. Additionally, it can simulate metrology measurements on any defect. This system is also capable of performing a range of lithography simulations, analysis, and other optical measurements. To support more complex designs, the unit is integrated into the latest lithography design and simulation tools from leading industry manufacturers such as Mentor Graphics and KLA. Overall, KLA SP3 SURFSCAN mask and wafer inspection machine is a reliable and highly accurate tool for detecting and classifying photomask and wafer defects of all sizes. Its combination of advanced optical beam scanning, sophisticated algorithms, and post-scan defect analysis make it an invaluable tool for the semiconductor fabrication industry.