Used KLA / TENCOR SP3 #293636213 for sale

KLA / TENCOR SP3 is an advanced mask and wafer inspection equipment, designed for high-performance pattern, defect, and failure detection for all sub-100nm process nodes. The system is equipped with industry-leading imaging and signal processing hardware and software to ensure both high signal contrast and signal resolution. KLA SP-3 also features High-Speed Defect Review (HSDR) to detect and analyze critical defects from even the highest resolution device structures. TENCOR SP 3 has a semi-automated unit which combines precision optics, beamsplitters, and CCDs with advanced imaging algorithms for powerful and sensitive inspection of complex wafer topographies. Its Source-Mask-Image (SMI) algorithm is capable of detecting more subtle defect features than visually perceptible to the operator. This reduces inspection time and provides superior defect detection accuracy. SP-3 also features a patented Architecture-Aware Algorithm (A3), which utilizes advanced pattern recognition and computer vision algorithms to quickly pinpoint and identify mask layout features with the assistance of a Viewer interface. The Viewer provides a remote graphical user interface with the ability to quickly modify and analyze data. The advanced automation capabilities of TENCOR SP3 machine allow users to program a huge variety of customized parameter settings and location strategies. This reduces the time it takes to reject patterns and minimize false positive errors. The tool has a powerful Defect Classification module, which automatically inspects and categorizes mask layout defects into two main categories - true defects and process-related defects. This feature makes it easier for users to quickly identify potential critical defect issues and take corrective action before starting the fabrication process. SP3 also has an integrated Cleanliness and Analytical Asset which incorporates sophisticated contamination detection technology for particles and stands. The model can detect practically all types of defects down to 40nm, including contamination from organic and metallic films, delamination, and even biological contamination. KLA / TENCOR SP-3 is a powerful mask and wafer inspection tool, combining advanced imaging and signal processing technologies with fast, accurate defect detection and analysis capabilities. Superior performance, flexibility, fast cycle times, and automated features make KLA SP 3 an ideal solution for high-performance pattern, defect, and failure detection at sub-100nm process nodes.